Institute of Fundamental Technological Research
Polish Academy of Sciences


F. Akhtar

Recent publications
1.  Alvi S., Jarząbek D.M., Kohan M.G., Hedman D., Jenczyk P., Natile M.M., Vomiero A., Akhtar F., Synthesis and mechanical characterization of a CuMoTaWV high-entropy film by magnetron sputtering, ACS Applied Materials and Interfaces, ISSN: 1944-8244, DOI: 10.1021/acsami.0c02156, Vol.12, No.18, pp.21070-21079, 2020

Development of high-entropy alloy (HEA) films is a promising and cost-effective way to incorporate these materials of superior properties in harsh environments. In this work, a refractory high-entropy alloy (RHEA) film of equimolar CuMoTaWV was deposited on silicon and 304 stainless-steel substrates using DC-magnetron sputtering. A sputtering target was developed by partial sintering of an equimolar powder mixture of Cu, Mo, Ta, W, and V using spark plasma sintering. The target was used to sputter a nanocrystalline RHEA film with a thickness of ~900 nm and an average grain size of 18 nm. X-ray diffraction of the film revealed a body-centered cubic solid solution with preferred orientation in the (110) directional plane. The nanocrystalline nature of the RHEA film resulted in a hardness of 19 ± 2.3 GPa and an elastic modulus of 259 ± 19.2 GPa. A high compressive strength of 10 ± 0.8 GPa was obtained in nanopillar compression due to solid solution hardening and grain boundary strengthening. The adhesion between the RHEA film and 304 stainless-steel substrates was increased on annealing. For the wear test against the E52100 alloy steel (Grade 25, 700-880 HV) at 1 N load, the RHEA film showed an average coefficient of friction (COF) and wear rate of 0.25 (RT) and 1.5 (300 °C), and 6.4 × 10^–6 mm^3/N m (RT) and 2.5 × 10^–5 mm^3/N m (300 °C), respectively. The COF was found to be 2 times lower at RT and wear rate 10^2 times lower at RT and 300 °C than those of 304 stainless steel. This study may lead to the processing of high-entropy alloy films for large-scale industrial applications.

high-entropy alloys, magnetron sputtering, spark plasma sintering, mechanical properties, wear

Alvi S. - other affiliation
Jarząbek D.M. - IPPT PAN
Kohan M.G. - other affiliation
Hedman D. - other affiliation
Jenczyk P. - IPPT PAN
Natile M.M. - other affiliation
Vomiero A. - other affiliation
Akhtar F. - other affiliation

Category A Plus


logo ippt            Pawińskiego 5B, 02-106 Warsaw
  +48 22 826 12 81 (central)
  +48 22 826 98 15

Find Us

© Institute of Fundamental Technological Research Polish Academy of Sciences 2021